第三届微电子学与等离子体技术国际会议(ICMAP-2011)

英文名称：The3rdInternationalConferenceonMicroelectronicsandPlasmaTechnology(ICMAP-2011)
会议时间：2011/7/4~2011/7/7
会议行业：电子电力
第三届微电子学与等离子体技术国际会议(ICMAP-2011)会议背景：
The3rdInternationalConferenceonMicroelectronicsandPlasmaTechnology(ICMAP-2011)willbeheldduringtheperiodofJuly4-7,2011inDalian,China.Theconferenceisintendedtoprovideanopenforumtoreportonrecenttechnicaladvancesofplasma-relateddisciplineswithstrongindustrialapplicationbackground,discusskeyissuesandidentifyfuturedevelopment.Theconferencescopewillincludeavarietyofprocessingtechnologiesrelatedtosemiconductor,display,andenergyconversiondevices,newlydevelopedmaterials,bio-medicalapplications,andplasmageneration,plasmadiagnosticsandsimulation,etc.
第三届微电子学与等离子体技术国际会议(ICMAP-2011)征文要求：
Theconferenceincludesinvitedandcontributedpapersonsomeorallofthefollowingtopics.

Materialsandprocessesforsemiconductordevices
Plasmatechnologyfornano-scaleSidevices
Thinfilmspreparedbyplasmatechnology
Plasmaetchingtechnology
Nano-materialsandnano-scaledevices
New-conceptmaterials,processes,anddevices
Materialsandprocessesfordisplaydevices
Processingforflatpaneldisplaydevices
Novelthinfilmtransistorsfordisplaybackplanes
Advancedflexibledisplaytechnology
Nextgenerationdisplaydevices
Materialsandprocessesforenergyconversiondevices
High-efficiencysolarcells
ThinfilmsolarcellswithPECVDtechnology
Newmaterialsandprocessingtechnologiesforsolarcells
Newmaterialsforenergyconversionandstorage
Plasmaforbio-medicalapplications
Bio-plasmassources
Plasma-Biomaterialsinteraction
Plasmamedicine
Plasmagenerationsandsimulations
Novelplasmasources
Plasmasimulations
Plasmadiagnostics
第三届微电子学与等离子体技术国际会议(ICMAP-2011)联系方式：
邮编：116024
地址：SchoolofPhysics&OptoelectronicEngineeringDalianUniversityofTechnology(DLUT),Dalian,Liaoning,116024,China
Email：[email protected]

原文地址：
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